新材料科技與化學技術創新
電(diàn)鍍中間體/水性工(gōng)業塗料/工業清洗化學品
Microfill™ LVF IV Acid Copper from Dupont Dow Rhom Hass company
2022-03-07 10:01
- Microfill™ LVF IV Acid Copper
Advanced Flip-Chip packages demand higher functionality in increasingly fine pitch substrates, resulting in the need to reliably create fine metal features. DuPont™ Microfill™ LVF IV Acid Copper plating process has been designed to meet these needs, using insoluble anodes and direct current (DC) plating in electroplating systems designed for substrate manufacturing.
- Designed for pattern plate capability, with excellent laser micro-via fill and pattern plate uniformity of Flip-Chip substrates.
- DC process with insoluble anodes to minimize idle-time effects.
- Bright, highly leveled, ductile deposit
- Easily analyzed and controlled by conventional CVS techniques.
- Highly tunable process for different product requirements.
Read Technical Paper
Next Generation Copper Pattern Plating for IC Package Application
Excellent viafill performance across the working panel in isolated and dense areas.
酸性鍍銅中間體相關鏈接：
垂(chuí)直連續電鍍（VCP）高TP值酸性鍍(dù)銅光(guāng)澤劑用電鍍中間體：unisun.cc/news/170.html
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